Suppression of Metal Oxide Formation and Improvement of Contact Resistance between Metal and Oxide Semiconductor by Self-assembled Monolayer | Intelligent Semiconductor and Wearable Devices

Suppression of Metal Oxide Formation and Improvement of Contact Resistance between Metal and Oxide Semiconductor by Self-assembled Monolayer

2024/01/26
Dowan Kang, Juyoung Yun, Yoonyoung Chung
Korean Conference on Semiconductors (KCS), Gyeongju, Korea

Category: Categories: Conference